Intelligent OPC Engineer Assistant for Semiconductor Manufacturing

Advancements in chip design and manufacturing have enabled the processing of complex tasks such as deep learning and natural language processing, paving the way for the development of artificial general intelligence (AGI). AI, on the other hand, can be leveraged to innovate and streamline semiconductor technology from planning and implementation to manufacturing. In this paper, we present \textit{Intelligent OPC Engineer Assistant}, an AI/LLM-powered methodology designed to solve the core manufacturing-aware optimization problem known as optical proximity correction (OPC). The methodology involves a reinforcement learning-based OPC recipe search and a customized multi-modal agent system for recipe summarization. Experiments demonstrate that our methodology can efficiently build OPC recipes on various chip designs with specially handled design topologies, a task that typically requires the full-time effort of OPC engineers with years of experience.

Differentiable Edge-based OPC

Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based OPC, termed as inverse lithography technology (ILT), has gained research interest due to its flexibility and precision. Its complexity and intricate features can lead to challenges in mask writing, increased defects, and higher costs, hence hindering widespread industrial adoption. In this paper, we propose DiffOPC, a differentiable OPC framework that enjoys the virtue of both edge-based OPC and ILT. By employing a mask rule-aware gradient-based optimization approach, DiffOPC efficiently guides mask edge segment movement during mask optimization, minimizing wafer error by propagating true gradients from the cost function back to the mask edges. Our approach achieves lower edge placement error while reducing manufacturing cost by half compared to state-of-the-art OPC techniques, bridging the gap between the high accuracy of pixel-based OPC and the practicality required for industrial adoption, thus offering a promising solution for advanced semiconductor manufacturing.

Customized Retrieval Augmented Generation and Benchmarking for EDA Tool Documentation QA

Retrieval augmented generation (RAG) enhances the accuracy and reliability of generative AI models by sourcing factual information from external databases, which is extensively employed in document-grounded question-answering (QA) tasks. Off-the-shelf RAG flows are well pretrained on general-purpose documents, yet they encounter significant challenges when being applied to knowledge-intensive vertical domains, such as electronic design automation (EDA). This paper addresses such issue by proposing a customized RAG framework along with three domain-specific techniques for EDA tool documentation QA, including a contrastive learning scheme for text embedding model fine-tuning, a reranker distilled from proprietary LLM, and a generative LLM fine-tuned with high-quality domain corpus. Furthermore, we have developed and released a documentation QA evaluation benchmark, ORD-QA, for OpenROAD, an advanced RTL-to-GDSII design platform. Experimental results demonstrate that our proposed RAG flow and techniques have achieved superior performance on ORD-QA as well as on a commercial tool, compared with state-of-the-arts. The ORD-QA benchmark and the training dataset for our customized RAG flow are open-source at https://github.com/lesliepy99/RAG-EDA.

MoreauPruner: Robust Pruning of Large Language Models against Weight Perturbations

Few-shot gradient methods have been extensively utilized in existing model pruning methods, where the model weights are regarded as static values and the effects of potential weight perturbations are not considered. However, the widely used large language models (LLMs) have several billion model parameters, which could increase the fragility of few-shot gradient pruning. In this work, we experimentally show that one-shot gradient pruning algorithms could lead to unstable results under perturbations to model weights. And the minor error of switching between data formats bfloat16 and float16 could result in drastically different outcomes. To address such instabilities, we leverage optimization analysis and propose an LLM structural pruning method, called MoreauPruner, with provable robustness against weight perturbations. In MoreauPruner, the model weight importance is estimated based on the neural network's Moreau envelope, which can be flexibly combined with $\ell_1$-norm regularization techniques to induce the sparsity required in the pruning task. We extensively evaluate the MoreauPruner algorithm on several well-known LLMs, including LLaMA-7B, LLaMA-13B, LLaMA3-8B, and Vicuna-7B. Our numerical results suggest the robustness of MoreauPruner against weight perturbations, and indicate the MoreauPruner's successful accuracy-based scores in comparison to several existing pruning methods. We have released the code in \url{https://github.com/ShiningSord/MoreauPruner}.

LLM-Enhanced Bayesian Optimization for Efficient Analog Layout Constraint Generation

Analog layout synthesis faces significant challenges due to its dependence on manual processes, considerable time requirements, and performance instability. Current Bayesian Optimization (BO)-based techniques for analog layout synthesis, despite their potential for automation, suffer from slow convergence and extensive data needs, limiting their practical application. This paper presents the \texttt{LLANA} framework, a novel approach that leverages Large Language Models (LLMs) to enhance BO by exploiting the few-shot learning abilities of LLMs for more efficient generation of analog design-dependent parameter constraints. Experimental results demonstrate that \texttt{LLANA} not only achieves performance comparable to state-of-the-art (SOTA) BO methods but also enables a more effective exploration of the analog circuit design space, thanks to LLM's superior contextual understanding and learning efficiency. The code is available at \url{https://github.com/dekura/LLANA}.

GNNavigator: Towards Adaptive Training of Graph Neural Networks via Automatic Guideline Exploration

Graph Neural Networks (GNNs) succeed significantly in many applications recently. However, balancing GNNs training runtime cost, memory consumption, and attainable accuracy for various applications is non-trivial. Previous training methodologies suffer from inferior adaptability and lack a unified training optimization solution. To address the problem, this work proposes GNNavigator, an adaptive GNN training configuration optimization framework. GNNavigator meets diverse GNN application requirements due to our unified software-hardware co-abstraction, proposed GNNs training performance model, and practical design space exploration solution. Experimental results show that GNNavigator can achieve up to 3.1x speedup and 44.9% peak memory reduction with comparable accuracy to state-of-the-art approaches.

CAMO: Correlation-Aware Mask Optimization with Modulated Reinforcement Learning

Optical proximity correction (OPC) is a vital step to ensure printability in modern VLSI manufacturing. Various OPC approaches based on machine learning have been proposed to pursue performance and efficiency, which are typically data-driven and hardly involve any particular considerations of the OPC problem, leading to potential performance or efficiency bottlenecks. In this paper, we propose CAMO, a reinforcement learning-based OPC system that specifically integrates important principles of the OPC problem. CAMO explicitly involves the spatial correlation among the movements of neighboring segments and an OPC-inspired modulation for movement action selection. Experiments are conducted on both via layer patterns and metal layer patterns. The results demonstrate that CAMO outperforms state-of-the-art OPC engines from both academia and industry.

HDLdebugger: Streamlining HDL debugging with Large Language Models

In the domain of chip design, Hardware Description Languages (HDLs) play a pivotal role. However, due to the complex syntax of HDLs and the limited availability of online resources, debugging HDL codes remains a difficult and time-intensive task, even for seasoned engineers. Consequently, there is a pressing need to develop automated HDL code debugging models, which can alleviate the burden on hardware engineers. Despite the strong capabilities of Large Language Models (LLMs) in generating, completing, and debugging software code, their utilization in the specialized field of HDL debugging has been limited and, to date, has not yielded satisfactory results. In this paper, we propose an LLM-assisted HDL debugging framework, namely HDLdebugger, which consists of HDL debugging data generation via a reverse engineering approach, a search engine for retrieval-augmented generation, and a retrieval-augmented LLM fine-tuning approach. Through the integration of these components, HDLdebugger can automate and streamline HDL debugging for chip design. Our comprehensive experiments, conducted on an HDL code dataset sourced from Huawei, reveal that HDLdebugger outperforms 13 cutting-edge LLM baselines, displaying exceptional effectiveness in HDL code debugging.

ChatPattern: Layout Pattern Customization via Natural Language

Existing works focus on fixed-size layout pattern generation, while the more practical free-size pattern generation receives limited attention. In this paper, we propose ChatPattern, a novel Large-Language-Model (LLM) powered framework for flexible pattern customization. ChatPattern utilizes a two-part system featuring an expert LLM agent and a highly controllable layout pattern generator. The LLM agent can interpret natural language requirements and operate design tools to meet specified needs, while the generator excels in conditional layout generation, pattern modification, and memory-friendly patterns extension. Experiments on challenging pattern generation setting shows the ability of ChatPattern to synthesize high-quality large-scale patterns.

Classes Are Not Equal: An Empirical Study on Image Recognition Fairness

In this paper, we present an empirical study on image recognition fairness, i.e., extreme class accuracy disparity on balanced data like ImageNet. We experimentally demonstrate that classes are not equal and the fairness issue is prevalent for image classification models across various datasets, network architectures, and model capacities. Moreover, several intriguing properties of fairness are identified. First, the unfairness lies in problematic representation rather than classifier bias. Second, with the proposed concept of Model Prediction Bias, we investigate the origins of problematic representation during optimization. Our findings reveal that models tend to exhibit greater prediction biases for classes that are more challenging to recognize. It means that more other classes will be confused with harder classes. Then the False Positives (FPs) will dominate the learning in optimization, thus leading to their poor accuracy. Further, we conclude that data augmentation and representation learning algorithms improve overall performance by promoting fairness to some degree in image classification. The Code is available at https://github.com/dvlab-research/Parametric-Contrastive-Learning.