ChipAlign: Instruction Alignment in Large Language Models for Chip Design via Geodesic Interpolation

Recent advancements in large language models (LLMs) have expanded their application across various domains, including chip design, where domain-adapted chip models like ChipNeMo have emerged. However, these models often struggle with instruction alignment, a crucial capability for LLMs that involves following explicit human directives. This limitation impedes the practical application of chip LLMs, including serving as assistant chatbots for hardware design engineers. In this work, we introduce ChipAlign, a novel approach that utilizes a training-free model merging strategy, combining the strengths of a general instruction-aligned LLM with a chip-specific LLM. By considering the underlying manifold in the weight space, ChipAlign employs geodesic interpolation to effectively fuse the weights of input LLMs, producing a merged model that inherits strong instruction alignment and chip expertise from the respective instruction and chip LLMs. Our results demonstrate that ChipAlign significantly enhances instruction-following capabilities of existing chip LLMs, achieving up to a 26.6% improvement on the IFEval benchmark, while maintaining comparable expertise in the chip domain. This improvement in instruction alignment also translates to notable gains in instruction-involved QA tasks, delivering performance enhancements of 3.9% on the OpenROAD QA benchmark and 8.25% on production-level chip QA benchmarks, surpassing state-of-the-art baselines.

DRC-Coder: Automated DRC Checker Code Generation Using LLM Autonomous Agent

In the advanced technology nodes, the integrated design rule checker (DRC) is often utilized in place and route tools for fast optimization loops for power-performance-area. Implementing integrated DRC checkers to meet the standard of commercial DRC tools demands extensive human expertise to interpret foundry specifications, analyze layouts, and debug code iteratively. However, this labor-intensive process, requiring to be repeated by every update of technology nodes, prolongs the turnaround time of designing circuits. In this paper, we present DRC-Coder, a multi-agent framework with vision capabilities for automated DRC code generation. By incorporating vision language models and large language models (LLM), DRC-Coder can effectively process textual, visual, and layout information to perform rule interpretation and coding by two specialized LLMs. We also design an auto-evaluation function for LLMs to enable DRC code debugging. Experimental results show that targeting on a sub-3nm technology node for a state-of-the-art standard cell layout tool, DRC-Coder achieves perfect F1 score 1.000 in generating DRC codes for meeting the standard of a commercial DRC tool, highly outperforming standard prompting techniques (F1=0.631). DRC-Coder can generate code for each design rule within four minutes on average, which significantly accelerates technology advancement and reduces engineering costs.

GPU-Accelerated Inverse Lithography Towards High Quality Curvy Mask Generation

Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of free-form curvilinear mask shapes that enhance printed wafer image quality and process window. However, a major challenge in implementing curvilinear ILT for large-scale production is mask rule checking, an area currently under development by foundries and EDA vendors. Although recent research has incorporated mask complexity into the optimization process, much of it focuses on reducing e-beam shots, which does not align with the goals of curvilinear ILT. In this paper, we introduce a GPU-accelerated ILT algorithm that improves not only contour quality and process window but also the precision of curvilinear mask shapes. Our experiments on open benchmarks demonstrate a significant advantage of our algorithm over leading academic ILT engines.

Intelligent OPC Engineer Assistant for Semiconductor Manufacturing

Advancements in chip design and manufacturing have enabled the processing of complex tasks such as deep learning and natural language processing, paving the way for the development of artificial general intelligence (AGI). AI, on the other hand, can be leveraged to innovate and streamline semiconductor technology from planning and implementation to manufacturing. In this paper, we present \textit{Intelligent OPC Engineer Assistant}, an AI/LLM-powered methodology designed to solve the core manufacturing-aware optimization problem known as optical proximity correction (OPC). The methodology involves a reinforcement learning-based OPC recipe search and a customized multi-modal agent system for recipe summarization. Experiments demonstrate that our methodology can efficiently build OPC recipes on various chip designs with specially handled design topologies, a task that typically requires the full-time effort of OPC engineers with years of experience.

Revisiting VerilogEval: Newer LLMs, In-Context Learning, and Specification-to-RTL Tasks

The application of large-language models (LLMs) to digital hardware code generation is an emerging field. Most LLMs are primarily trained on natural language and software code. Hardware code, such as Verilog, represents only a small portion of the training data and few hardware benchmarks exist. To address this gap, the open-source VerilogEval benchmark was released in 2023, providing a consistent evaluation framework for LLMs on code completion tasks. It was tested on state-of-the-art models at the time including GPT-4. However, VerilogEval and other Verilog generation benchmarks lack failure analysis and, in present form, are not conducive to exploring prompting techniques. Also, since VerilogEval's release, both commercial and open-source models have seen continued development. In this work, we evaluate new commercial and open-source models of varying sizes against an improved VerilogEval benchmark suite. We enhance VerilogEval's infrastructure and dataset by automatically classifying failures, introduce new prompts for supporting in-context learning (ICL) examples, and extend the supported tasks to specification-to-RTL translation. We find a measurable improvement in commercial state-of-the-art models, with GPT-4 Turbo achieving a 59% pass rate on spec-to-RTL tasks. We also study the performance of open-source and domain-specific models that have emerged, and demonstrate that models can benefit substantially from ICL. We find that recently-released Llama 3.1 405B achieves a pass rate of 58%, effectively matching that of GPT-4 Turbo, and that the much smaller domain-specific RTL-Coder 6.7B models achieve an impressive 37% pass rate. However, prompt engineering is key to achieving good pass rates, and varies widely with model and task. A benchmark infrastructure that allows for prompt engineering and failure analysis is key to continued model development and deployment.

Differentiable Edge-based OPC

Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based OPC, termed as inverse lithography technology (ILT), has gained research interest due to its flexibility and precision. Its complexity and intricate features can lead to challenges in mask writing, increased defects, and higher costs, hence hindering widespread industrial adoption. In this paper, we propose DiffOPC, a differentiable OPC framework that enjoys the virtue of both edge-based OPC and ILT. By employing a mask rule-aware gradient-based optimization approach, DiffOPC efficiently guides mask edge segment movement during mask optimization, minimizing wafer error by propagating true gradients from the cost function back to the mask edges. Our approach achieves lower edge placement error while reducing manufacturing cost by half compared to state-of-the-art OPC techniques, bridging the gap between the high accuracy of pixel-based OPC and the practicality required for industrial adoption, thus offering a promising solution for advanced semiconductor manufacturing.

VerilogCoder: Autonomous Verilog Coding Agents with Graph-based Planning and Abstract Syntax Tree (AST)-based Waveform Tracing Tool

Due to the growing complexity of modern Integrated Circuits (ICs), automating hardware design can prevent a significant amount of human error from the engineering process and result in less errors. Verilog is a popular hardware description language for designing and modeling digital systems; thus, Verilog generation is one of the emerging areas of research to facilitate the design process. In this work, we propose VerilogCoder, a system of multiple Artificial Intelligence (AI) agents for Verilog code generation, to autonomously write Verilog code and fix syntax and functional errors using collaborative Verilog tools (i.e., syntax checker, simulator, and waveform tracer). Firstly, we propose a task planner that utilizes a novel Task and Circuit Relation Graph retrieval method to construct a holistic plan based on module descriptions. To debug and fix functional errors, we develop a novel and efficient abstract syntax tree (AST)-based waveform tracing tool, which is integrated within the autonomous Verilog completion flow. The proposed methodology successfully generates 94.2% syntactically and functionally correct Verilog code, surpassing the state-of-the-art methods by 33.9% on the VerilogEval-Human v2 benchmark.

Code Less, Align More: Efficient LLM Fine-tuning for Code Generation with Data Pruning

Recent work targeting large language models (LLMs) for code generation demonstrated that increasing the amount of training data through synthetic code generation often leads to exceptional performance. In this paper we explore data pruning methods aimed at enhancing the efficiency of model training specifically for code LLMs. We present techniques that integrate various clustering and pruning metrics to selectively reduce training data without compromising the accuracy and functionality of the generated code. We observe significant redundancies in synthetic training data generation, where our experiments demonstrate that benchmark performance can be largely preserved by training on only 10% of the data. Moreover, we observe consistent improvements in benchmark results through moderate pruning of the training data. Our experiments show that these pruning strategies not only reduce the computational resources needed but also enhance the overall quality code generation.

GOALPlace: Begin with the End in Mind

Co-optimizing placement with congestion is integral to achieving high-quality designs. This paper presents GOALPlace, a new learning-based general approach to improving placement congestion by controlling cell density. Our method efficiently learns from an EDA tool's post-route optimized results and uses an empirical Bayes technique to adapt this goal/target to a specific placer's solutions, effectively beginning with the end in mind. It enhances correlation with the long-running heuristics of the tool's router and timing-opt engine -- while solving placement globally without expensive incremental congestion estimation and mitigation methods. A statistical analysis with a new hierarchical netlist clustering establishes the importance of density and the potential for an adequate cell density target across placements. Our experiments show that our method, integrated as a demonstration inside an academic GPU-accelerated global placer, consistently produces macro and standard cell placements of superior or comparable quality to commercial tools. Our empirical Bayes methodology also allows a substantial quality improvement over state-of-the-art academic mixed-size placers, achieving up to 10x fewer design rule check (DRC) violations, a 5% decrease in wirelength, and a 30% and 60% reduction in worst and total negative slack (WNS/TNS).

ILILT: Implicit Learning of Inverse Lithography Technologies

Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography systems, Extensive design optimizations are required to tackle the design and silicon mismatch. Inverse lithography technology (ILT) is one of the promising solutions to perform pre-fabrication optimization, termed mask optimization. Because of mask optimization problems' constrained non-convexity, numerical ILT solvers rely heavily on good initialization to avoid getting stuck on sub-optimal solutions. Machine learning (ML) techniques are hence proposed to generate mask initialization for ILT solvers with one-shot inference, targeting faster and better convergence during ILT. This paper addresses the question of \textit{whether ML models can directly generate high-quality optimized masks without engaging ILT solvers in the loop}. We propose an implicit learning ILT framework: ILILT, which leverages the implicit layer learning method and lithography-conditioned inputs to ground the model. Trained to understand the ILT optimization procedure, ILILT can outperform the state-of-the-art machine learning solutions, significantly improving efficiency and quality.