PatternPaint: Generating Layout Patterns Using Generative AI and Inpainting Techniques

Generation of VLSI layout patterns is essential for a wide range of Design For Manufacturability (DFM) studies. In this study, we investigate the potential of generative machine learning models for creating design rule legal metal layout patterns. Our results demonstrate that the proposed model can generate legal patterns in complex design rule settings and achieves a high diversity score. The designed system, with its flexible settings, supports both pattern generation with localized changes, and design rule violation correction. Our methodology is validated on Intel 18A Process Design Kit (PDK) and can produce a wide range of DRC-compliant pattern libraries with only 20 starter patterns.

On Improving Hotspot Detection Through Synthetic Pattern-Based Database Enhancement

Continuous technology scaling and the introduction of advanced technology nodes in Integrated Circuit (IC) fabrication is constantly exposing new manufacturability issues. One such issue, stemming from complex interaction between design and process, is the problem of design hotspots. Such hotspots are known to vary from design to design and, ideally, should be predicted early and corrected in the design stage itself, as opposed to relying on the foundry to develop process fixes for every hotspot, which would be intractable. In the past, various efforts have been made to address this issue by using a known database of hotspots as the source of information. The majority of these efforts use either Machine Learning (ML) or Pattern Matching (PM) techniques to identify and predict hotspots in new incoming designs. However, almost all of them suffer from high false-alarm rates, mainly because they are oblivious to the root causes of hotspots. In this work, we seek to address this limitation by using a novel database enhancement approach through synthetic pattern generation based on carefully crafted Design of Experiments (DOEs). Effectiveness of the proposed method against the state-of-the-art is evaluated on a 45nm process using industry-standard tools and designs.

Bias Busters: Robustifying DL-based Lithographic Hotspot Detectors Against Backdooring Attacks

Deep learning (DL) offers potential improvements throughout the CAD tool-flow, one promising application being lithographic hotspot detection. However, DL techniques have been shown to be especially vulnerable to inference and training time adversarial attacks. Recent work has demonstrated that a small fraction of malicious physical designers can stealthily "backdoor" a DL-based hotspot detector during its training phase such that it accurately classifies regular layout clips but predicts hotspots containing a specially crafted trigger shape as non-hotspots. We propose a novel training data augmentation strategy as a powerful defense against such backdooring attacks. The defense works by eliminating the intentional biases introduced in the training data but does not require knowledge of which training samples are poisoned or the nature of the backdoor trigger. Our results show that the defense can drastically reduce the attack success rate from 84% to ~0%.